China has begun limited production of domestically developed immersion DUV lithography machines as part of its push for semiconductor self-sufficiency. SMIC, China’s largest chip foundry, has been testing a tool built by Shanghai Yuliangsheng Technology since September 2025, designed for 28 nm-class chip processes and potentially capable of reaching 7 nm nodes through advanced multi-patterning techniques. Mass production at SMIC is targeted as early as 2027, while SMEE reportedly sold around ten units of its SSA800 series. Millions of logic dies are expected to be produced in 2026 using existing inventories of imported DUV machines, but US lawmakers proposed additional restrictions specifically targeting immersion DUV tools in April 2026.
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